Contamination Control for Liquids
Critical Process Filtration manufactures ultraclean filters for the wide range of chemicals and solutions used in display manufacturing. We offer a broad choice of devices and filtration media for photoresists, etchants, strippers and the ultrapure water used to mix solutions and rinse the displays.
Protect Yields from Air/Gas Contamination
Process gases have not been a significant source of contamination until recently. The development of higher resolution displays means that smaller and smaller contaminants, including those carried in gas streams, must be controlled at a finer level. Critical Process filters are available in both high flow configurations for bulk distribution filtration and in small capsules for very low flows.